Research

My research vision is to accomplish improvement of energy storage/conversion devices with a simple and efficient nano-engineering method

Atomic layer deposition (ALD) is a thin film deposition technique based on the self-limiting reaction of the gas phase chemicals.
ALD forms one layer-by-one layer, so can control thickness in the Angstrom scale with high conformality and uniformity
Therefore, ALD can utilize a wide range of nanoscale materials and fabricate structures for energy storage/conversion devices.

Design and manufacturing ALD system

Design process and ALD setup

Manufacture ALD systems

I can design and manufacture customized ALD systems from scratch to actual products, and have experience in making various types of ALD systems, e.g., Thermal ALD / Novel plasma source ALD / UV ALD / Powder ALD.

Also, I have utilized the ALD technique in various applications such as fuel cells, batteries, catalysts, mechanical coating, optical coating, and more.

The demand for electrical power management has increased in recent years with the increasing contribution of renewable energy.
Electrical energy conversion/storage systems are core technologies for effective power management.
Depending on the purpose, energy systems with different specific energy and power are required.

low-temperature
Solid oxide fuel cells

Electrostatic
Thin-film capacitors

LT-SOFCs decrease the operating temperature below 500°C
Lowering operating temperature triggers an increase in electrochemical losses

I have applied ALD-based nanomaterials (YSZ, CeO2, doped CeO2, Ru, etc.) and structure (electrolyte, interlayer and overcoating) to LT-SOFCs to encourage electrochemical reaction

Electrostatic capacitors have high specific power and low specific energy
with a fast charge/discharge period

I have fabricated ALD-based thin-film capacitors and modified the properties of the dielectric layer (density, crystallinity, phase) of capacitors combining ALD and plasma to improve the energy storage property

Co-Work